Professor or Assistant/Associate Professor in atomic layer deposition (ALD) and etching (ALEt)
University of Helsinki, Department of Chemistry

The University of Helsinki is among the leading multidisciplinary research universities in the world. In addition to its 11 faculties, the University includes several independent institutes, some of which are jointly operated with other universities. Some 35,000 students are currently pursuing an undergraduate or a postgraduate degree at the University of Helsinki.


As a part of the Faculty of Science, the Department of Chemistry has a wide profile and it carries out international level research in three research programs, i.e., materials chemistry, synthesis and analysis, and molecular science. The Department operates on an annual budget of 20 million euros and reports more than 200 FTE person-years per annum. The Department has 14 tenured professors, 2 tenure-track associate professors, and 1 visiting professor. More details on the Department of Chemistry:


The Department of Chemistry at the Faculty of Science at the University of Helsinki invites applications for a




The field of the position is atomic layer deposition (ALD) and etching (ALEt), and it will be based in the Materials chemistry research programme in the Department of chemistry. The position is part of the University of Helsinki profiling action on Matter and Materials, aiming to strengthen new interdisciplinary research areas in this strategic research area of the university. The aim of this particular position is to strengthen experimental studies on surface reaction mechanisms in ALD and ALEt methods.


The selected candidate will work as a member of research group ‘Helsinki ALD – thin films and nanostructured materials’ ( The group has currently 11 ALD reactors, precursor synthesis facilities and is well supported by various characterisation techniques in the departments of chemistry and physics. Most importantly for this position, one ALD reactor is equipped with a quadrupole mass spectrometer and quartz crystal microbalance for the in situ studies on ALD and ALEt chemistry, and a new in vacuo instrument connecting an ALD reactor to XPS and other selected surface characterisation techniques will be purchased in 2020-21. The candidate will be in active role in designing the new equipment and taking that into a use. In addition, in collaboration with local scientists in Max IV synchrotron facility in Lund, Sweden, and a research team from the Department of Physics at the University of Helsinki, the ALD research group is in a process of constructing a novel ALD cell to the near ambient XPS setup in Max IV.


The person to be chosen is expected to have broad experimental experience in ALD and/or gas-solid surface science studies on chemical processes. To be successful in the position, the candidate must have a background in inorganic materials chemistry, physical chemistry or surface science. She/he must have a strong network of international cooperation. The appointee is expected to conduct research on an internationally high level. In addition, the appointee must take advantage of national and international research funding opportunities, participate in doctoral education at the Department, and participate in the interaction between science and society at large. The teaching area of the position is chemistry. The person chosen for the position is also expected to develop the teaching within the chemistry curriculum in the areas of English-speaking BSc-level chemistry and MSc-level inorganic materials chemistry education.


The University will offer the appointee a challenging career opportunity in top-level research and research-based teaching, possibilities for international collaboration, and for the appointed assistant/associate professor prerequisites to grow into full professorship. In addition to the funding possibilities offered by the national funding agencies, the Faculty of Science opens calls on a yearly basis for infrastructure funding. The selected person will also get a startup package of about 150 000 EUR/year for the first three years.



According to the Regulations of the University of Helsinki, a professor must hold a doctoral degree and have high-level academic qualifications, experience in heading scientific research. The professor must also be able to provide research-based teaching of high quality, supervise dissertations and theses as well as evidence of international cooperation in the field.


An assistant/associate professor must hold a doctoral degree and ability for independent scientific work as well as teaching skills required by the position. Furthermore, the successful candidate is expected to have competence and motivation for scientific career proven by scientific publications and other academic activities.


When assessing the qualifications of each candidate, attention will be paid to scientific publications and other research results of scientific value, teaching experience and pedagogical training, the ability to produce teaching materials, other teaching merits, and, if deemed necessary, teaching skills as demonstrated in a lecture as well as participation in doctoral education. Furthermore, attention will be paid to the applicant’s activities within the research community, success in obtaining research funding, research work abroad and elected positions in international organisations.


Salary and benefits

A typical starting salary for a newly appointed professor is about 5700-6000 euros/month. The starting salary of an assistant (associate) professor is about 4700 euros/month (5200 euros/month).


The University of Helsinki offers comprehensive services to its employees, including occupational health care and health insurance, sports facilities, and opportunities for professional development. The International Staff Services office ( assists employees from abroad with their transition to work and life in Finland.


How to apply

Applications must have the following enclosures as a one single pdf file (in English):


1) an academic portfolio approved by the Faculty (as set out at, containing a summary of supervision duties of master’s and doctoral theses and a presentation on how the applicant plans to develop her/his field and its teaching;
2) a list of those publications and other relevant documents on competence and merits that the applicant wishes to be taken into account in the selection process


The shortlisted candidates will later be asked to submit up to 10 selected publications into the University of Helsinki Recruitment System upon request of the Faculty.


Please submit your application using the University of Helsinki Recruitment System by clicking "Apply for the position" button below.


Applicants who are employees of the University of Helsinki are requested to leave their application via the SAP HR portal (


The deadline for applications is January 31, 2019.


Further information

Further information on the position and the working environment may be obtained from:

Professor Heikki Tenhu, Head of the Department of Chemistry, heikki.tenhu(at)

Professor Mikko Ritala, Vice-head of the Department of Chemistry, leader of the research group Helsinki ALD – thin films and nanostructured materials, mikko.ritala(at)


Due date
31.01.2019 23:59 EET

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